High-voltage electron beam lithography systems in nanofabrication typically require voltages in the range of several kilovolts (kV) to tens of kilovolts. The specific voltage requirement can vary based on the design and capabilities of the system, as well as the desired resolution and depth of focus for the lithography process.
These systems use electron beams to create patterns on a substrate at a nanometer scale. The high voltage is necessary to accelerate the electrons to high energies, allowing for precise control over the beam's focus and positioning, which is crucial for achieving fine patterns and high-resolution features on the substrate.
It's important to note that the exact voltage requirement can vary between different systems and technologies, and advancements in nanofabrication technology could potentially lead to changes in these voltage requirements over time. If you're looking for specific information about a particular system, I recommend consulting the manufacturer's documentation or technical specifications for accurate and up-to-date information.