High-voltage electron beam lithography (EBL) systems are used in nanofabrication processes to create extremely fine patterns on a substrate. The voltage requirement for the operation of such systems can vary widely depending on the specific design, manufacturer, and intended application. However, in general, high-voltage EBL systems typically operate in the range of tens of kilovolts (kV) to hundreds of kilovolts.
The high voltage is necessary to accelerate the electrons in the electron beam to high energies, allowing for precise control and focusing of the beam to achieve the fine patterning required in nanofabrication. The specific voltage requirement will depend on factors such as the desired resolution, beam current, substrate material, and the dimensions of the structures being created.
It's important to note that the exact voltage requirement can vary from system to system and can change as technology advances. If you are working with or planning to use a high-voltage electron beam lithography system, it's best to refer to the manufacturer's specifications or consult with experts in the field to get the most accurate and up-to-date information on the voltage requirements for your specific system.